洁净室研讨会及产品展示2005 会议议程
CleanRooms China Conference 2005 Agenda

9月19日 (上午08:00 - 开始登记)
Sep 19 (08:00 - Registration)
内容 Content 演讲者Speaker 演讲公司 Company
会议主持人:
杨景安 Yang Jing AnM+W副总经理
Deputy General Mnager
上海市洁净技术专业委员会 副主任
Vice Director , Shanghai Purification Technology , Association
Welcome Address Adonis Mak, 麦协林 CleanRooms China Magazine
洁净室的静电控制
Electrostatic Protective of Cleanroom
罗宏昌- 秘书长
Hongchang Luo– Secretary General
上海防静电协会
Shanghai Electrostatic Protective Industrial Association
先进的污染控制解决方案
Advanced contamination-control resolution
周臻
George Zhou
杜邦
Dupont
茶歇(Coffee Break, SSTC and CRC 2005)
分子过滤器在洁净室中的合理使用
Confidence in Molecular Filtration
王小兵–总经理
Xiao Bing, Wang Manager Director
康婓尔
Camfilfarr
午餐,休息( Lunch, SSTC and CRC )
会议主持人:
杨景安 Yang Jing AnM+W副总经理
Deputy General Mnager
上海市洁净技术专业委员会 副主任
Vice Director , Shanghai Purification Technology , Association
颗粒基础及测试
Particle Basic & Measurement
刘强 - 销售渠道工程师
Qiang Liu,Distribution Channel Engineer
Mike Hopfe, HUA公司空气颗粒计数器产品经理,
Product Manager, Air Particle Counter
哈希
HACH
半导体无尘室系统设计
Design of Semiconductor Cleanroom Systems
徐嘉立-总经理
Charlie, J.L. Shyu President
汉唐
UIS
提问时段 Q & A
抽奖 Lucky Draw

9月20日 (上午08:00 - 登记)
Sep 20 (08:00 a.m. - Registration)
内容 Content 演讲者Speaker 演讲公司 Company
会议主持人:
范存养Fan ,Cun Yang同济大学教授 Tongji University
Dept.of Thermal Engineering
中国电子学会洁净室技术分会 顾问委员
ADVISOR MEMBER OF CLEANING TECHNIOUE COUNCIL OF CHINA ELECTRONICS ACADEMY
AMC Control in Clean Rooms Klaus KuemmerleJoint Manager of M+W Zander's Airbome Molecular Contamina Group M+W Zander
致力于未来
Committing to the future
杨广寒 -市场代表
Guanghan Yang - Market Representative
德图
TESTO
茶歇(Coffee Break, SSTC and CRC 2005)
防静电洁净面料的特性、选用标准及鉴别方法 黄建华总经理
Jianhua HuangGeneral Manager
晨隆贸易
Shanghai Chenglong InternationTrade
午餐,休息( Lunch, SSTC and CRC )
会议主持人:
范存养Fan ,Cun Yang同济大学教授 Tongji University
Dept.of Thermal Engineering
中国电子学会洁净室技术分会 顾问委员
ADVISOR MEMBER OF CLEANING TECHNIOUE COUNCIL OF CHINA ELECTRONICS ACADEMY
微生物污染与生物洁净技术 沈晋明- 教授
Jinming, Shen- Professor
同济大学
Tongji University
华虹NEC 洁净室环境中的光刻技术研发现状以及华虹对0.13微米、0.09微米、和0.065微米门电路光刻难易程度的观点.
The Status of Photolithography Development at Huahong NEC in a Cleanroom Environment and HHNEC's View on the Process Easiness for 0.13 um, 0.09 um, and 0.065 um Gate Photolithography
伍强--光刻组主任技术开发部主任/高级主管工程师

Qiang WuTechnology Development Div. Manager, Photolithography
华 虹 NEC


HHNEC
微环境的应用于六寸及八寸的晶园厂
Mini Environment Implementation on 6 inches & inches Foundries
史猛,副总经理
Ted Shi,
中国电子系统工程总公司华东分公司
China Electronics System Engineering Corp. Shanghai Office
上海新佐港实业发展有限公司
Shanghai XZG Industrial Developing Co., Ltd.
提问时段 Q & A session
抽奖 Lucky Draw
招待酒会(凭酒会出席券)SSTC and CRC


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